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SEM and e-Beam Lithography
The SEM (pictured above) is serving two roles for
us. We are using it as a microscopy tool for imaging structures down to a
sub-micron scale as well as to monitor surface morphology of grown or etched
III-Nitride films. Additionally, we have modified it to use as an e-beam
lithography tool, allowing us the capability of fabricating devices and (use in
conjunction with our plasma-therm ICP) structures to a sub-micron scale as well.
Above: SEM images of different GaN patterns by e-beam lithograph
Above: SEM images showing (a) top
view of a GaN microlens of diameter d = 21.9 mm.
(b) a 60o tilt
view of a GaN microlens array in an area of about 80 mm
x 80 mm.
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